ASML Holding NV
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$1,399.39
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$1,399.98
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$1,404.32
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$1,399.39
Market Snapshot
$539.93B
48.0
20.69
$30.41B
ASML Holding NV engages in the development, production, marketing, sales, upgrading and servicing of advanced semiconductor equipment systems. The company is headquartered in Veldhoven, Noord-Brabant and currently employs 43,520 full-time employees. The firm operates through its subsidiaries in the Netherlands, the United States, Italy, France, Germany, the United Kingdom, Ireland, Belgium, South Korea, Taiwan, Singapore, China, Hong Kong, Japan, Malaysia and Israel. The firm operates through one business segment which is engage in development, production, marketing, sales, upgrading and servicing of advanced semiconductor equipment systems, consisting of lithography, metrology and inspection systems. The firm offers TWINSCAN systems, equipped with lithography system with a mercury lamp as light source (i-line), Krypton Fluoride (KrF) and Argon Fluoride (ArF) light sources for processing wafers for manufacturing environments for which imaging at a small resolution is required. TWINSCAN systems also include immersion lithography systems (TWINSCAN immersion systems).
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ASML Holding NV engages in the development, production, marketing, sales, upgrading and servicing of advanced semiconductor equipment systems. The company is headquartered in Veldhoven, Noord-Brabant and currently employs 43,520 full-time employees. The firm operates through its subsidiaries in the Netherlands, the United States, Italy, France, Germany, the United Kingdom, Ireland, Belgium, South Korea, Taiwan, Singapore, China, Hong Kong, Japan, Malaysia and Israel. The firm operates through one business segment which is engage in development, production, marketing, sales, upgrading and servicing of advanced semiconductor equipment systems, consisting of lithography, metrology and inspection systems. The firm offers TWINSCAN systems, equipped with lithography system with a mercury lamp as light source (i-line), Krypton Fluoride (KrF) and Argon Fluoride (ArF) light sources for processing wafers for manufacturing environments for which imaging at a small resolution is required. TWINSCAN systems also include immersion lithography systems (TWINSCAN immersion systems).
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